Knee Surgery, Sports Traumatology, Arthroscopy March 2017, Volume 25, Issue 3, pp 729–735

Superior femoral component alignment can be achieved with Oxford microplasty instrumentation after minimally invasive unicompartmental knee arthroplasty

Tu, Y., Xue, H., Ma, T. et al.
Knee

Purpose

Oxford microplasty (MP) instrumentation has been developed to facilitate the reproducible and consistent performance of minimally invasive unicompartmental knee arthroplasty (MI-UKA) operation. The aim of this study was to compare the clinical and radiographic results of two groups of patients implanted using either a conventional instrumentation technique or an MP technique.

Methods

A prospective cohort study of 108 knees in 108 patients who underwent an MI-UKA procedure using either conventionally instrumented UKA (CI-UKA) (52 knees of 52 patients) or MP-assisted UKA (MP-UKA) (56 knees of 56 patients). The clinical assessment included the Oxford Knee Score (OKS), the Knee Society Score (KSS), a visual analogue scale (VAS) for pain, and range of motion (ROM). Complications were also recorded.

 

Results

No significant differences were observed between the two groups regarding OKS, KSS, VAS, and ROM. There were also no significant differences in terms of mechanical limb alignment and tibia implant alignment. However, the MP-UKA group showed significantly more accurate positioning of the femoral component than the CI-UKA group. Additionally, the MP-UKA group had more femoral prostheses implanted in the “satisfactory” range and fewer “outliers” than the CI-UKA group. No significant difference in complications was noted between the two groups.

 

Conclusion

This study suggested that compared with CI-UKA, MP-UKA provides significant improvements in increasing the accuracy of sagittal and coronal implantation of the femoral component and in reducing the numbers of outliers for femoral prosthetic alignment. It is advocated that the MP system should be considered when MI-UKA is performed.

 

Level of evidence

Therapeutic study, Level IV.


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